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    • Overview
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    • PHOTO MASK
    • Functional products
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    • Quality·Environmental·Health·Management Policy
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Company Overview

  1. CEO Greeting
  2. History
  3. Award
  4. Certification
  5. Patent

Patent

Easy-to-detach photomasks for contact lithography processes and their manufacturing methods

An eco-friendly photomask with excellent ease of cleaning and wear resistance, and a method of manufacturing the same

A high-permeable photomask and its manufacturing method

Method of forming an emulsion photomask with improved surface hardness and antifouling functionality

Anti-charge photo mask and its manufacturing method with chemical resistance and goto rate

How to repair pattern loss defects in the anti-coating photomask

Versatile transparent photo mask and its manufacturing method with anti-charge and anti-war characteristics

Eco-friendly photomasks and their manufacturing methods to improve photolithography yields with excellent cleaning ease

Photomask for preventing damage by electrostatic discharge(ESD) and manufacturing method thereof

High-powered mask for pattering use and its manufacture method using high-powered laser

COG manufacturing method using direct image realization


NEPCO [15600] 55, 83BEON-GIL, SANDAN-RO, DANWON-GU, ANSAN-SI, GYEONGGI-DO, REPUUBLIC OF KOREA | Tel : +82-31-492-4291 | E-mail : pm@nepco.co.kr
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