History
2024
12
Registration Patent (Easy-to-detach photomasks for contact lithography processes and their manufacturing methods]
08
Obtained ISO 45001:2018 certification( KMR)
2022
06
registration Patent (A high-permeable photomask and its manufacturing method)
04
registration Patent (An eco-friendly photomask with excellent ease of cleaning and wear resistance, and a method of manufacturing the same)
2021
10
Registered patent. (Method of forming an emulsion photomask with improved surface hardness and antifouling functionality)
01
Promising export small and from exports certificate.
2020
06
Registered patent
(Anti-charge photo mask and its manufacturing method with chemical resistance and goto rate)
03
Registered patent
(How to repair pattern loss defects in the anti-coating photomask)
Registered patent
(Versatile transparent photo mask and its manufacturing method with anti-charge and anti-war characteristics
2019
10
Designated as a material parts company
Minister of Industry Award
2018
12
Prime Minister's Commendation
09
Registered patent
(Eco-friendly photomasks and their manufacturing methods to improve photolithography yields with excellent cleaning ease)
04
Obtained ISO 9001:2015 Revision certification(Korea Management Association Registrations)
Obtained ISO 14001:2015 Revision certification(Korea Management Association Registrations)
2017
11
Awarded AURI (Korea Association of University, Research Institute and Industry) Chairman's Award
Obtained NET (New Excellent Technology) certification (Manufacturing method for Photomask ESD protection)
10
Nominated as a Government Supported R&D company (Manufacturing process for Functional photomask)
06
Excellent Work Place Certification
Nominated as a Ppuri-Corporation for Government Supported R&D Program (Establishing of uniformed automatic coating system)
Nominated as a Government Supported R&D Program company (Development of yield-enhanced photomask)
03
Registered patent of (Photomask for preventing damage by electrostatic discharge (ESD) and its manufacturing process)
01
Awarded MAIN-BIZ certification
2016
10
Registered as a KDIA (Korea Display Industry Association) member company)
08
Nominated as a Ppuri-Industry Company & Ppuri technology specialized company
2015
06
Excellent environmental management certification from Ansan Industrial Complex Support Division
2014
06
Obtained ISO 14001 certification (Korea Management Association Registrations)
03
Facilities Expansion (Production of largest size Photomask in Korea)
02
Registered patent (High-powered mask for pattering using high-powered laser and its production method)
01
Nominated as a Strong small company (Ministry of Employment & Labor)
2013
11
Appointed as a company for military service (Military Manpower Administration)
2012
04
Registered as a KPCA (Korean Printed Circuit Association) member company)
2010
08
Registered patent (COG manufacturing method using direct image )
2009
04
Selected as Promising small & Medium business in Gyunggi-do
2008
10
Awarded the citation of the Minister of Justice
09
Obtained INNO-BIZ certification
05
Established company-affiliated R&D institute
2006
04
Obtained ISO 9001 certification (Korea Management Association Registrations)
2004
07
Registered patent
(Guide hole and space planning method)
2003
06
Korea International Trade Association (Registration of KITA member company)
05
Established overseas branch office (Vietnam Hanoi)
01
Registered patent (Interface method between local system ~ plotter)
2002
06
Registered Trademark (NEPCO Co. Ltd) (No. 41-2000-0031759)
2001
07
Registered patent (CAM Software)
2000
04
Corporate conversion (Trade name changed to NEPCO Co. Ltd)
1997
05
Introduced Genesis Workstation
1994
03
Introduced Laser plotter
1992
07
Established New Electronic Planning Corporation