Photomask anti-fouling is used to protect mask surface from contamination by thin-film coating.
Furthermore it has special advantage to wipe off easily the contaminations on a surface by using a dry wiper, so it can improve product yield.
Glass surface energy = 310 mJ/m2
Perfluoro compound surface energy = 18 mJ/m2
Our anti-fouling coating technology is to build anti fouling function by reducing surface energy about 20 times less than the normal glass mask by stably forming a layer consisting of perfluoro composite on it.
Ensure work safety by eliminating hazardous chemicals
Easy and simple chemical free photomask cleaning
Non-chemical based environmentally friendly cleaning process
Improve productivity by reducing photomask cleaning process tine.
No use of cleaning chemicals such as solvents, acids or alkalis
Reducing provisional facility investment burden : cleaning facilities and LDI
Improvement of the exposure yield
(photoresist and organic particulate deposition, Prevents contamination particulate particles and haze, and provides efficient cleaning control of contaminated substrates)
|Sortation||Inspection yield||Foreign matter detection amount|
|Anti-fouling Coating Mask Application Process||99.8||1.2|
|General mask application process||98.9||2.3|
Improve production by applying anti-fouling coating masks.
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