History

about-image

2020

06

Registered patent
(Anti-charge photo mask and its manufacturing method with chemical resistance and goto rate)

03

Registered patent
(How to repair pattern loss defects in the anti-coating photomask)

Registered patent
(Versatile transparent photo mask and its manufacturing method with anti-charge and anti-war characteristics

2019

10

Designated as a material parts company
Minister of Industry Award

2018

12

Prime Minister's Commendation

09

Registered patent
(Eco-friendly photomasks and their manufacturing methods to improve photolithography yields with excellent cleaning ease)

04

Obtained ISO 9001:2015 Revision certification(Korea Management Association Registrations)
Obtained ISO 14001:2015 Revision certification(Korea Management Association Registrations)

2017

11

Awarded AURI (Korea Association of University, Research Institute and Industry) Chairman's Award
Obtained NET (New Excellent Technology) certification (Manufacturing method for Photomask ESD protection)

10

Nominated as a Government Supported R&D company (Manufacturing process for Functional photomask)

06

Excellent Work Place Certification
Nominated as a Ppuri-Corporation for Government Supported R&D Program (Establishing of uniformed automatic coating system)
Nominated as a Government Supported R&D Program company (Development of yield-enhanced photomask)

03

Registered patent of (Photomask for preventing damage by electrostatic discharge (ESD) and its manufacturing process)

01

Awarded MAIN-BIZ certification

2016

10

Registered as a KDIA (Korea Display Industry Association) member company)

08

Nominated as a Ppuri-Industry Company & Ppuri technology specialized company

2015

06

Excellent environmental management certification from Ansan Industrial Complex Support Division

2014

06

Obtained ISO 14001 certification (Korea Management Association Registrations)

03

Facilities Expansion (Production of largest size Photomask in Korea)

02

Registered patent (High-powered mask for pattering using high-powered laser and its production method)

01

Nominated as a Strong small company (Ministry of Employment & Labor)

2013

11

Appointed as a company for military service (Military Manpower Administration)

2012

04

Registered as a KPCA (Korean Printed Circuit Association) member company)

2010

08

Registered patent (COG manufacturing method using direct image )

2009

04

Selected as Promising small & Medium business in Gyunggi-do

2008

10

Awarded the citation of the Minister of Justice

09

Obtained INNO-BIZ certification

05

Established company-affiliated R&D institute

2006

04

Obtained ISO 9001 certification (Korea Management Association Registrations)

2004

07

Registered patent
(Guide hole and space planning method)

2003

06

Korea International Trade Association (Registration of KITA member company)

05

Established overseas branch office (Vietnam Hanoi)

01

Registered patent (Interface method between local system ~ plotter)

2002

06

Registered Trademark (NEPCO Co. Ltd) (No. 41-2000-0031759)

2001

07

Registered patent (CAM Software)

2000

04

Corporate conversion (Trade name changed to NEPCO Co. Ltd)

1997

05

Introduced Genesis Workstation

1994

03

Introduced Laser plotter

1992

07

Established New Electronic Planning Corporation